DKT Energy Technology

National High-Tech Enterprise; Sichuan Provincial Enterprise Technology Center; Class B Qualification For Chemical Engineering Design; Class A Qualification For Environmental Pollution Prevention And Control; Pressure Pipeline GC1 Design Qualification

Advanced Drying of Chlorine/Chlorine Hydrogen, and Technology for Recovering Chlorosilanes and Hydrogen from Polysilicon Off-Gases


  (1) Deep drying of chlorine/chlorine hydrogen

  In the polysilicon production process, high-purity trichlorosilane is obtained through chemical means, and its synthesis requires the use of ultra-high-purity chlorine gas, hydrogen gas, and hydrogen chloride gas (with a water content of ≤10 ppm). Therefore, both commercial chlorine gas (containing 400–1,000 ppm of water) and synthesized hydrogen chloride (containing 1,000–3,000 ppm of water) must undergo thorough drying. In the chlor-alkali industry, dried chlorine gas is used as a raw material for chemical production. Dakote provides specialized adsorbents and temperature-swing adsorption technology that can reduce the water content in chlorine gas to below 2 ppm. Currently, our company holds a market share of over 90% for such equipment.

  Technical Features and Advantages

  µ Advanced and mature technology, simple process flow, and stable and reliable operation.

  µ High degree of dehydration, minimal loss of chlorine/chlorine hydrogen gas, and no secondary pollution.

  µ Low operating energy consumption, low dewatering costs, and strong economic benefits.

  µ The device features a high degree of automation, enabling network-based remote monitoring and unattended operation.

  µ Requires less investment than other conventional methods, has a shorter construction period, and occupies a smaller footprint.

  Application Fields

  T Deep drying of highly acidic gases such as chlorine and hydrogen chloride

  (2) Polysilicon Off-Gas Recovery Technology for Chlorosilanes and Hydrogen

  During polysilicon production, processes such as trichlorosilane synthesis, hydrogen reduction, and tetrachlorosilane hydrolysis generate off-gas streams containing hydrogen, hydrogen chloride, dichlorosilane, trichlorosilane, and tetrachlorosilane. In response to the characteristics of these off-gases, Dakote has specifically developed adsorbents tailored for chlorosilanes and hydrogen chloride, along with corresponding adsorption–separation process technologies. These solutions enable nearly 100% recovery of chlorosilanes, hydrogen chloride, and hydrogen from the off-gases, thereby closing the loop in the polysilicon production process, significantly reducing raw-material consumption, and enhancing the economic performance of polysilicon producers.

 Details

  Technical Features and Advantages

  µ Advanced and mature technology, simple process flow, and stable and reliable operation.

  µ The adsorbent specially designed for chlorosilanes exhibits a high separation factor and a high recovery rate for chlorosilanes.

  µ The recovered chloride and hydrogen exhibit high purity, fully meeting the production requirements of polysilicon plants.

  µ Low operating energy consumption and good economic benefits

  µ The device features a high degree of automation, enabling network-based remote monitoring and unattended operation.

  µ Low-temperature separation is characterized by low capital investment, a short construction period, and a small land footprint.

  Application Fields

  Separation and Recovery of Chlorosilanes, Hydrogen Chloride, and Hydrogen from Exhaust Gases in the Polysilicon Production Process

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Sichuan DKT Energy Technology Co., Ltd.( A subsidiary of Hydrexia (China))