1、Deep drying of chlorine/hydrogen chloride

In the production process of polysilicon industry, it is necessary to obtain high-purity trichlorosilane by chemical means, and the synthesis of trichlorosilane must use high-purity chlorine gas, hydrogen gas and hydrogen chloride gas (water content ≤ 10 ppm), therefore, the commercial chlorine gas (water content 400-1000 ppm) and synthetic hydrogen chloride (water content: 1000 - 3000 ppm) must be deeply dried. In the chlor-alkali industry, dry chlorine gas needs to be used as raw materials for chemical production. DKT have special adsorbents and temperature swing adsorption technology, which can remove the water in chlorine to below 2 ppm. At present, our market share of such plants is over 90%.

Technical features and advantages:

- Advanced and proven technology, simple process flow, and stable and reliable operation;

- High degree of dehydration, low loss of chlorine/hydrogen chloride gas, and no secondary pollution;

- Low operation energy consumption, low dehydration cost and good economic benefit;

- The plant has a high degree of automation, allowing remote monitoring and unattended operation;

- Less investment, shorter construction cycle and smaller footprint compared with other traditional methods.

Application:

- Deep drying of high acid gases such as chlorine gas and hydrogen chloride.

2、Recovery of chlorosilane and hydrogen from polysilicon tail gas

In the process of polysilicon production, the tail gas containing hydrogen, hydrogen chloride, dichlorosilane, trichlorosilane and tetrachlorosilane is by-product from trichlorosilane synthesis process, hydrogen reduction process and tetrachlorosilane hydrogenation process. According to the characteristics of the tail gas, DKT has developed special adsorbents for chlorosilane and hydrogen chloride and supporting adsorption separation technology, which can recover nearly 100% of chlorosilane, hydrogen chloride and hydrogen in the tail gas. The closed cycle of polysilicon production process is realized, the consumption of raw materials is greatly reduced, and the economic benefits of polysilicon enterprises are improved.

Technical features and advantages:

- Advanced and proven technology, simple process flow, and stable and reliable operation;

- The special adsorbent for chlorosilane has high separation coefficient and high chlorosilane recovery;

- The purity of recovered chloride and hydrogen is high, which can completely meet the production requirements of polysilicon plant;

- Low energy consumption and good economic benefit

- The plant has a high degree of automation, allowing remote monitoring and unattended operation;

- Less investment, shorter construction cycle and smaller footprint compared with low temperature separation method.

Application:

- Separation and recovery of chlorosilane, hydrogen chloride and hydrogen from tail gas in polysilicon production process.