(1) Chlorine/hydrogen chloride deep drying

In polysilicon industry production process, need through chemical method to obtain high purity trichlorosilane, trichlorosilane must use high purity chlorine, hydrogen and hydrogen chloride gas (water content 10 ppm or less). Therefore, it is necessary to deeply dry commercial chlorine gas (400 ~ 1000ppm water) and synthetic hydrogen chloride (1000 ~ 3000ppm water). In the chlor-alkali industry, dried chlorine gas is needed for chemical production raw materials. Sichuan DKT Energy Technology company provides special adsorbent and variable temperature adsorption technology, which can remove the water in chlorine gas to below 2ppm. At present, our company has more than 90% market share of such devices.

Technical features and advantages

µ Advanced and mature technology, simple process flow, stable and reliable operation

µ High dehydration depth, small loss of chlorine/hydrogen chloride gas, no secondary pollution

µ Low operating energy consumption, low dehydration cost and good economic benefits

µ High degree of automation device, network remote monitoring, unattended

µ Less investment, shorter construction cycle and smaller footprint than other traditional methods

Application field

Chlorine, hydrogen chloride and other high acid gas depth drying

(2) Polysilicon tail gas recovery chlorosilane and hydrogen technology

In the process of polysilicon production, there are trichlorosilane synthesis process, hydrogen reduction process and tetrachlorosilane hydrogenation process, etc., by-product containing hydrogen, hydrogen chloride, dichlorosilane, trichlorosilane, tetrachlorosilane tail gas. According to the characteristics of the exhaust gas Sichuan DKT Energy Technology company specially developed chlorosilane and hydrogen chloride special adsorbent and form a complete set of adsorption separation technology, to exhaust the chlorosilane, nearly 100% of hydrogen chloride and hydrogen recovery, to achieve closed cycle of polysilicon production process, greatly reduce raw material consumption, improve the polysilicon enterprise economic benefits.

Technical features and advantages

µ It is advanced and mature technology, simple process, stable and reliable operation

µ The special adsorbent for chlorosilane has high separation coefficient and high recovery rate of chlorosilane

µ The recovered chloride and hydrogen are of high purity, which can fully meet the production requirements of polysilicon plants

µ It has low energy consumption and good economic benefit

µ The device has a high degree of automation, which can realize network remote monitoring and unattended operation

µ Compared with the low temperature separation method, the investment is less, the construction cycle is shorter, and the occupation is small

Application field

T Separation and recovery of chlorosilane, hydrogen chloride and hydrogen in the tail gas of polysilicon production